One is placed in Interuniversity Didactic-Technological Center with 350 m² of useful area and the second placed in Laboratory for Semiconductor Structures and Nanotechnology with area of 250 m². Both clean-rooms are equipped with systems for supplying: high purity 7N-class hydrogen, high purity 7N-class nitrogen, tree independent systems for deionized water DI, vacuum, chilled water system and compressed air.

• AIXTRON MOVPE epitaxial system with 3x2 Flip Top Close Coupled Showerhead reactor
• MOVPE epitaxial system with AIXTRON R&D 200 quartz reactor
• Kurt J. Lesker UHV system for metal layers evaporation and sputtering
• Oxford Instruments PlasmaLab 80 Plus system for Reactive Ion Etching RIE
• Oxford Instruments PlasmaLab 80 Plus system for Plasma Enhanced PE CVD
• Oxford Instruments PlasmaLab 100 system for Inductively Coupled Plasma CVD and growth of Diamond-Like Carbon DLC
• Optical and electron lithography systems
• Delvotech bonder

• Hitachi SU 6600 Scanning Electron Microscope with the EDX extension for chemical analysis
• Setups for spectral analysis in the wavelength range from 350 up to 1700 nm (reflectance, photoluminescence, transmittance, colorimetric measurements)
• Veeco MultiMode Atomic Force Microscope AFM equipped with NanoScope V controller
• Phillips Materials Research Diffractometers MRD for HRXRD inspection
• BioRad setup for optical and electrical characterization of semiconductor structures enabling executing of
  I-V, C-V, EC-V and PVS measurements